Particle formation during low-pressure chemical vapor deposition from silane and oxygen: measurement, modeling, and film properties / T.Kim,S.-M.Suh,S.L.Girshick и др.;T.Kim, S.-M.Suh, S.L.Girshick et al., 2002. - 413-423 p. p. - Текст : непосредственный.
Numerical modeling of gas-phase nucleation and particle growth during chemical vapor deposition of silicon / S.L.Girshick,M.T.Swihart,S.-M.Suh и др., 1999. - 12 p. - Текст : непосредственный.
Suh S.-M. Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor / S.-M.Suh,M.R.Zachariah,S.L.Girshick, 2002. - 943-959 p. p. - Текст : непосредственный.