Girshick S.L. Diamond growth chemistry during atmospheric-pressure plasma CVD / S. L. Girshick, J. W. Lindsay, 1996. - 10 p. - Текст : непосредственный.
Girshick S.L. Particle nucleation and growth in thermal plasmas / S. L. Girshick, 1993. - 21 p. - Текст : непосредственный.
Yu B.W. Atomic carbon vapor as a diamond growth precursor in thermal plasmas / B. W. Yu, S. L. Girshick, 1993. - 33 p. - Текст : непосредственный.
Girshick S.L. Thermal plasma synthesis of diamond / S.L.Girshick,J.M.Larson, 1997. - 8 p. - Текст : непосредственный.
Lindsay J.W. Effect of surface species concentrations and temperature on diamond film morphology in inductively-coupled RF plasma CVD / J.W.Lindsay,J.M.Larson,S.L.Girshick, 1997. - 7 p. - Текст : непосредственный.
Particle formation during low-pressure chemical vapor deposition from silane and oxygen: measurement, modeling, and film properties / T.Kim,S.-M.Suh,S.L.Girshick и др.;T.Kim, S.-M.Suh, S.L.Girshick et al., 2002. - 413-423 p. p. - Текст : непосредственный.
UMSI research report / Univ. of Minnesota(Mn). Supercomputing inst. for digital simulation and advanced computation. 1999/20 : Ab initio structures and energetics of selected hydrogenated silicon clusters containing six to ten silicon atoms / M. T.Swihart,S. L.Girshick, 2002. - 527-532 p. p. - Текст : непосредственный.
Yu B.W. Chemical vapor deposition of diamond film with an atmospheric-pressure plasma : Boundary-layer chemistry / B.W.Yu,H.Han,S.L.Girshick, 1993. - 9 p. - Текст : непосредственный.
Numerical modeling of gas-phase nucleation and particle growth during chemical vapor deposition of silicon / S.L.Girshick,M.T.Swihart,S.-M.Suh и др., 1999. - 12 p. - Текст : непосредственный.
Swihart M.T. Ab initio structures and energetics of selected hydrogenated silicon clusters containing six to ten silicon atoms / M.T.Swihart,S.L.Girshick, 1999. - 11 p. - Текст : непосредственный.
Swihart M. analysis of flow, temperature and chemical composition distortion in gas sampling through an orifice during chemical vapor deposition / M.Swihart,S.L.Girshick, 1999. - 35 p. - Текст : непосредственный.
Girshick S.L. A model for chemical vapor deposition of diamond in an RF thermal plasma / S.L.Girshick,B.W.Yu, 1994. - Pag.var. с. - Текст : непосредственный.
Generation and growth of nanoparticles in low-pressure plasmas / U.R.Kortshagen,U.V.Bhandarkar,M.T.Swihart,S.L.Girshick, 1999. - 4 p. - Текст : непосредственный.
Suh S.-M. Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor / S.-M.Suh,M.R.Zachariah,S.L.Girshick, 2002. - 943-959 p. p. - Текст : непосредственный.
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